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Sputtering Targets

Model:

Category: 3D Printing Materials

Exhibitor:

FULL WELFARE CO., LTD.

Booth No:

Description

Metal powder manufactured by vacuum induction melting/ inert gas atomization with Sanyo’s original technology provides superior sputtering targets with fine microstructure and high compositional homogeneity.

CHARACTERISTICS:
※High density targets are produced by using suitable consolidation process (Ultra High Pressing or Hot Isostatic Pressing (HIP))

※Sanyo’s targets contribute to the improvement of customer’s productivity by high PTF conversion and high toughness with fine microstructure.

※Various compositions such as Fe-Based, Co-Based, Ni-Based and Cr-Based alloy, have been delivered with Sanyo’s unique material design, to meet customer’s request.

For HDD-media - Cr/Ti , Ni/Ta , Co/W , Ni/W , Ni/Fe/W , Co/Zr/Nb , Co/Fe/Zr/Nb , Co/Fe/Ta/Mo , Co/Fe/B ...etc。

For magnetic heads - Co/Fe/B , Co/Fe , Co , Ni/Fe ,Ta alloys , Tb alloys , Fe/Si/Al ...etc。

For coating - Cr/V , Cr/Ti , Cr/B , Ti/Al , Ti/B , Al/Cr...etc。

If you have any queries regarding Sputtering Targets, please do not hesitate to contact us.